Tungsten Titanium Sputtering Target

Tungsten Titanium Sputtering Lub Hom Phiaj:

Peb Tungsten Titanium Sputtering Targets yog tsim los ntawm kev siv cov hmoov metallurgical kev tsim cov txheej txheem. Peb muab WTi sputtering lub hom phiaj nyob rau hauv ntau qhov ntau thiab tsawg, mus txog 400 millimeters inch. Peb yog cov thawj manufacturers tsim WTi ua ob lub hom phiaj teb thiab lub hom phiaj npaj. Cov ntsiab lus titanium ntawm peb lub hom phiaj WTi feem ntau yog 10% los ntawm qhov hnyav.

Tungsten-titanium Sputtering Targets

Tungsten-titanium alloy

Daim ntawv thov thaj chaw rau tungsten-titanium:
Tungsten-titanium (WTi), uas muaj 10% titanium los ntawm qhov hnyav, yog siv los ua cov kua nplaum metallization thiab diffusion barrier hauv microchips. Nyob rau hauv cov ntaub ntawv no, WTi yog siv los cais cov metallization thiab semiconductor txheej, xws li tooj liab los ntawm silicon los yog txhuas los ntawm silicon. Yog tsis muaj kev cuam tshuam kev sib kis, silicon thiab tooj liab yuav sib xyaw ua ke los tsim cov theem intermetallic hauv microchips, uas yuav cuam tshuam qhov kev ua haujlwm ntawm semiconductor. Ib txheej WTi barrier yog siv nyob rau hauv saj zawg zog nyias zaj duab xis solar cells (CIGS) kom tsis txhob hlau ions los ntawm diffusing los ntawm molybdenum rov qab hu thiab mus rau hauv lub semiconductor. Kev ua haujlwm ntawm CIGS hnub ci hlwb tuaj yeem txo qis los ntawm tsawg li ob peb g / g ntawm hlau.

a.Powder metallurgy yog siv los tsim tungsten titanium sputtering lub hom phiaj, uas yog feem ntau siv nyob rau hauv semiconductor thiab nyias zaj duab xis solar cell manufacturing.

b.WTi10wt% nyias zaj duab xis yog siv nyob rau hauv semiconductor daim ntaub ntawv raws li ib tug adhesion txheej thiab diffusion barrier rau cais cov metallization txheej los ntawm cov semiconductor, xws li tooj liab los yog txhuas los ntawm silicon. Yog li ntawd, qhov kev ua haujlwm ntawm transistor hauv microchips tuaj yeem txhim kho tau zoo heev.

c.WTi10wt% nyias zaj duab xis kuj yog siv nyob rau hauv nyias zaj duab xis hnub ci hlwb raws li ib tug barrier txheej kom tsis txhob hlau ions los ntawm diffusing los ntawm cov hlau substrate rau molybdenum rov qab hu thiab CIGS semiconductor.Cov hom phiaj ua los ntawm tungsten titanium kuj siv los npog cov cuab yeej thiab LEDs. .

Nyob rau hauv ob daim duab, lub flip nti semiconductor metallization siv WTi cov khaubncaws sab nraud povtseg yog qhia hauv qab no schematic kev tsim kho ntawm CIGS hnub ci cell ntawm sab laug.

Qhov zoo ntawm txheej nce nrog txheej txheej purity. Txhawm rau kom ntseeg tau tias qib siab tshaj plaws ntawm cov khoom siv purity, peb tsuas yog siv cov hmoov purest thiab sib tov rau hauv peb tus kheej cov chaw txij thaum pib. Los ntawm cov hmoov mus rau cov khoom tiav, peb ua tib zoo saib txhua theem kom paub tseeb tias tsuas yog lub hom phiaj nrog qhov tseeb guaranteed ceev, purity, thiab ib homogeneous microstructure tawm ntawm peb qhov chaw.

Peb lub Hoobkas muaj peev xwm tsim cov hom phiaj nrog WTi 90/10wt%, WTi 85/15wt%, thiab tshwj xeeb muaj pes tsawg leeg Tungsten Titanium Sputtering Targets uas tuaj yeem kho. Qhov ceev ntawm lub hom phiaj tiag tiag yog> 99%, thiab qhov loj npaum li cas yog 100um. Cov neeg siv kawg tuaj yeem ua tiav qhov kev yaig tas mus li thiab siab purity thiab homogeneous nyias zaj duab xis txheej thaum lub sij hawm PVD txheej txheem nrog txog 4N5 purity thiab tshwj xeeb annealing kev kho mob, uniform grain loj, thiab txo cov roj cov ntsiab lus.

Yog tias koj muaj kev xav tau lossis cov lus nug, thov koj xav tiv tauj peb.

 

 

Tiv tauj peb

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